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Agilent AN 369-5
Multi-frequency C-V Measurement
of Semiconductors
Application Note
Agilent E4980A and 4284A Solutions Offered by the
Precision LCR Meters E4980A and 4284A
1. Wide Frequency Range Thus, the E4980A and the 4284A
Introduction
Measurements from 20 Hz to 2 MHz. can single-handedy perform C-V
measurements in both the low and
Parameters such as the capacitance
The program listing shown in the high frequency ranges. This allows it
of the oxide layer (Cox) and the
appendix was used to measure to measure high-loss devices (semi-
density of substrate impurities (Nsub)
the C-V characteristics at 10 kHz, conductors on large diameter wafers,
that are required in the evaluation of
100 kHz, and 1 MHz of the MOS etc.), which are difficult to measure at
the manufacturing process of MOS
device whose characteristics are 1 MHz, at low frequencies (10 kHz,
type semiconductors can be derived
shown in Figure 1. 100 kHz, etc.).
by using measured C-V characteris-
tics. To make an accurate evaluation
of these processes, precise C-V
measurements are required. Such
measurements entail the following
difficulties.
1.0
Difficulties
1. There is no single instrument that
Cap/cox
can make C-V measurements from
low to high frequencies.
2. It is difficult to compensate for
the additional errors that occur
when cable extensions or a
prober are used. 0.0
3. The accuracy and reliability of