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Now downloading free:Agilent 5991-3251EN Vapor Annealing Effect on Copolymers Studied by 7500 AFM with Environmental Control-Appl

Agilent 5991-3251EN Vapor Annealing Effect on Copolymers Studied by 7500 AFM with Environmental Control-Appl free download

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File name:5991-3251EN Vapor Annealing Effect on Copolymers Studied by 7500 AFM with Environmental Control-Appl
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Descr: Agilent 5991-3251EN Vapor Annealing Effect on Copolymers Studied by 7500 AFM with Environmental Control-Application Note c20141020 [2].pdf
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File name 5991-3251EN Vapor Annealing Effect on Copolymers Studied by 7500 AFM with Environmental Control-Appl

Keysight Technologies Vapor Annealing Effect on Copolymers Studied by 7500 Atomic Force Microscopy with Environmental Control Application Brief Topography Introduction 7500 AFM system is comprised of a sealed environmental chamber. The Microphase separation is a ubiquitous desired vapor can be realized readily phenomenon in copolymer thin ilms by putting a small vial of corresponding due to the immiscibility and dissimilar solution into the chamber. In this appli- nature of their block components. Such cation brief, results on an atomic force segregations could occur in directions microscopy (AFM)-based investigations both perpendicular and parallel to on the annealing effect on triblock the underlying support substrate. In copolymer PS-b-PB-b-PS (SBS) will be particular, the latter case will expose presented. all of polymer components to the air/ polymer interface and form periodic AFM Structural microdomains consisting with distinc- tive chemical identities. The spatial dis- Characterization of the Phase tribution (i.e.; their geometry, spacing Triblock Copolymer as well as patterning) of the compo- nents play an extremely important role SBS without Annealing in the chemical and physical properties of polymers. The initial triblock copolymer SBS samples were prepared by spin-casting Polymer annealing offers an effective of their 10mg/ml solution in toluene means to tune and regulate those com- onto a smooth silicon substrate at ponent domains. Generally, annealing room temperature and under ambi- can be introduced by heating the copo- ent conditions. Figure 1 are both AFM lymer ilms well above thei



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