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Now downloading free:Agilent 5991-3091EN Effect of Annealing on 50nm Gold Films - Application Note c20141027 [4]  [report bad file]  

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5991-3091EN Effect of Annealing on 50nm Gold Films - Application Note c20141027 [4]

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5991-3091EN Effect of Annealing on 50nm Gold Films - Application Note c20141027 [4].pdfKeysight Technologies Effect of Annealing on 50nm Gold Films Application Note Abstract Ultra-thin gold ilms are used in many Ref Description Condition modern applications to impart essen- A 50nm gold ilm on bare wafer (fused Al2O3 and TiC) As deposited tial optical qualities to surfaces. In this work, a new nanoindentation technolo- A' 50nm gold ilm on bare wafer (fused Al2O3 and TiC) Annealed 3 hrs gy, Express Test, is used to evaluate the B 50nm gold ilm on 2.6m of Al2O3 on bare wafer As deposited effect of annealing on 50nm gold ilms. 50nm gold ilm on 2.6m of Al2O3 on bare wafer Annealed 3 hrs B' Vacuum annealing for three hours (sub 300

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